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FreeSpirit (Shanghai) Precision Instrument Co., Ltd
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ning range of 10 μm. In the image, it can be clearly seen that the surface potential is irregularly distributed within h-BN.

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The Surface Potential of 2D Materials
The Surface Potential of 2D Materials
  • Microelectrode
    Microelectrode
  • 2D Material's Magnetic Domains
    2D Material's Magnetic Domains
  • Glass Substrate
    Glass Substrate
    • FreeSpirit (Shanghai) Precision Instrument Co., Ltd
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    s a surface topography image of a polished silicon wafer with a scanning range of 0.272 mm × 0.408 mm. The surface height variation across the entire scanned area ranges between -12 nm and 6 nm, with a roughness of 0.842 nm. Polished silicon wafers are fundamental and critical substrate materials in semiconductor manufacturing. Their surface quality directly affects subsequent photolithography, thin-film deposition and other processes.

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    Polished Silicon Wafer
    Polished Silicon Wafer
    FreeSpirit (Shanghai) Precision Instrument Co., Ltd
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