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  • 182 nm Standard Step Height
    182 nm Standard Step Height
  • Girds Matrix
    Girds Matrix
  • Roughness Standard Sample
    Roughness Standard Sample
  • Laser Marked Sample
    Laser Marked Sample
  • ETL Structure
  • Metal Groove
    Metal Groove
  • Polished Silicon Wafer
    Polished Silicon Wafer
  • f approximately 1.7 mm and a depth of approximately 1 mm. It can provide a basis for analyzing the degree of mechanical damage on the material surface, evaluating the wear resistance of the material, and improving surface processing and treatment processes.

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    Metal Scratch
    Metal Scratch