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<0-.5.5v1.293L8.354 1.146ZM2.5 14V7.707l5.5-5.5 5.5 5.5V14H10v-4a.5.5 0 0 0-.5-.5h-3a.5.5 0 0 0-.5.5v4H2.5Z" /> Current Location：Home > Knowledge Center > Image Gallery
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FreeSpirit (Shanghai) Precision Instrument Co., Ltd
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0.408 mm. The surface height variation across the entire scanned area ranges between -12 nm and 6 nm, with a roughness of 0.842 nm. Polished silicon wafers are fundamental and critical substrate materials in semiconductor manufacturing. Their surface quality directly affects subsequent photolithography, thin-film deposition and other processes.

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Polished Silicon Wafer
Polished Silicon Wafer
FreeSpirit (Shanghai) Precision Instrument Co., Ltd
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中