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System
- All
- AFM-Piccolo
- AFM-Baritone
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- AFM-Tuner
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- AFM-WLI Duet
Application
- All
- Semiconductor
- Display
- 2D Materials
- Thin films
- Polymer
- MEMS
- Metals
- Optical Element
- Metal

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66,1.568c0.771,0.77,1.313,1.711,1.568,2.768c0.199,0.77,0.229,1.567,0.113,2.338 C15.847,7.191,15.618,7.42,15.333,7.42z" /> +86 21 65208265/+86 17721158621

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ge of a polished silicon wafer with a scanning range of 0.272 mm × 0.408 mm. The surface height variation across the entire scanned area ranges between -12 nm and 6 nm, with a roughness of 0.842 nm. Polished silicon wafers are fundamental and critical substrate materials in semiconductor manufacturing. Their surface quality directly affects subsequent photolithography, thin-film deposition and other processes.

Polished Silicon Wafer

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