Image Gallery
Image Gallery
Knowledge Center
Image Gallery

Current Location:Home > Knowledge Center > Image Gallery

0.408 mm. The surface height variation across the entire scanned area ranges between -12 nm and 6 nm, with a roughness of 0.842 nm. Polished silicon wafers are fundamental and critical substrate materials in semiconductor manufacturing. Their surface quality directly affects subsequent photolithography, thin-film deposition and other processes.

">
Polished Silicon Wafer
Polished Silicon Wafer
="1.1" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink" x="0px" y="0px" width="16px" height="16px" fill="currentColor" viewBox="0 0 16 16" enable-background="new 0 0 16 16" xml:space="preserve"> +86 21 65208265/+86 17721158621

info@frsinst.com

Room 2109, 21st Floor, Building 2, Ruihong Enterprise World, 118 Feihong Road, Hongkou District, Shanghai

-->
pe="text/javascript" charset="utf-8">