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• System

  • All
  • AFM-Piccolo
  • AFM-Baritone
  • AFM-Tenor
  • AFM-Tuba
  • AFM-Tuner
  • WLI-Marimba
  • AFM-WLI Duet
• Application

  • All
  • Semiconductor
  • Display
  • Polymer
  • MEMS
  • Metals
  • Optical Element
  • Metal
  • 2D-Materials
  • Thin Film

• 
  [AFM] Glass Substrate
• 
  [AFM] 2D Material's Magnetic Domains
• 
  [AFM] Microelectrode
• 
  [AFM] The Surface Potential of 2D Materials
• 
  [AFM] Standard Wafer
• 
  [AFM] The Surface Potential of SRAM
• 
  [AFM] The Edge Structure of PSS
• 
  [AFM] SiC Surface
• 
  [AFM] ETL Structure
• 
  [AFM] OLED Pattern
• 
  [AFM] CMP Micro-Hole Array
• 
  [AFM] Patterned Sapphire Substrate (PSS)
• 
  [AFM] SiC Atomic Step
• 
  [AFM] Surface Potential of Au-Al Material
• 
  [AFM] LTPS Grains
• 
  [WLI] Flat Mirror
• 
  [WLI] Convex Lens
• 
  [WLI] 182 nm Standard Step Height
• 
  [WLI] Girds Matrix
• 
  [WLI] Roughness Standard Sample

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This image of LTPS grains (scan size: 5 μm) shows an RMS roughness of approximately 10 nm and a grain size of 150 nm. LTPS is the abbreviation of Low Temperature Poly-Silicon, and mainly used in the display and solar photovoltaic industries. AFM characterization is essential for optimizing its surface morphology.

[AFM] LTPS Grains

[WLI] Flat Mirror

[WLI] Convex Lens

[WLI] 182 nm Standard Step Height

[WLI] Girds Matrix

[WLI] Roughness Standard Sample

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