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with a roughness of 0.842 nm. Polished silicon wafers are fundamental and critical substrate materials in semiconductor manufacturing. Their surface quality directly affects subsequent photolithography, thin-film deposition and other processes.

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Polished Silicon Wafer
Polished Silicon Wafer

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182 nm Standard Step Height
182 nm Standard Step Height
  • Girds Matrix
    Girds Matrix
  • Roughness Standard Sample
    Roughness Standard Sample
  • Laser Marked Sample
    Laser Marked Sample
  • Lubricant Seal Cover
    Lubricant Seal Cover
  • Metal Groove
    Metal Groove
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