EN
EN
中
Current Location：Home > Knowledge Center > Image Gallery
Filter by：

留言提交中...
FreeSpirit (Shanghai) Precision Instrument Co., Ltd
EN
中
mm × 0.408 mm. The surface height variation across the entire scanned area ranges between -12 nm and 6 nm, with a roughness of 0.842 nm. Polished silicon wafers are fundamental and critical substrate materials in semiconductor manufacturing. Their surface quality directly affects subsequent photolithography, thin-film deposition and other processes.

">
Polished Silicon Wafer
Polished Silicon Wafer
  • Metal Scratch
    Metal Scratch

    • 留言提交中...
    FreeSpirit (Shanghai) Precision Instrument Co., Ltd
    EN
    中
    boxClass: 'wow', animateClass: 'animated', offset: 100, mobile: false, live: true }); wow.init();