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nm and 6 nm, with a roughness of 0.842 nm. Polished silicon wafers are fundamental and critical substrate materials in semiconductor manufacturing. Their surface quality directly affects subsequent photolithography, thin-film deposition and other processes.

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Polished Silicon Wafer
Polished Silicon Wafer

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="M11.162,3.404c0,1.336,1.083,2.418,2.419,2.418S16,4.74,16,3.404l0,0c0-1.336-1.082-2.42-2.419-2.42 C12.245,0.984,11.162,2.066,11.162,3.404L11.162,3.404z" /> info@frsinst.com

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