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System
- All
- AFM-Piccolo
- AFM-Baritone
- AFM-Tenor
- AFM-Tuba
- AFM-Tuner
- WLI-Marimba
- AFM-WLI Duet
Application
- All
- Semiconductor
- Display
- 2D Materials
- Thin films
- Polymer
- MEMS
- Metals
- Optical Element
- Metal

LTPS Grain
PLZT
Tape Magnetic Domains
LiNbO3 Ferroelectric Film
The Surface Potential of 2D Materials
2D Material's Magnetic Domains
Glass Substrate
The Square-Shaped Pattern of the PZT Material
Flat Mirror
Convex Lens

This is a surface topography image of a polished silicon wafer with a scanning range of 0.272 mm × 0.408 mm. The surface height variation across the entire scanned area ranges between -12 nm and 6 nm, with a roughness of 0.842 nm. Polished silicon wafers are fundamental and critical substrate materials in semiconductor manufacturing. Their surface quality directly affects subsequent photolithography, thin-film deposition and other processes.