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• System

  • All
  • AFM-Piccolo
  • AFM-Baritone
  • AFM-Tenor
  • AFM-Tuba
  • AFM-Tuner
  • WLI-Marimba
  • AFM-WLI Duet
• Application

  • All
  • Semiconductor
  • Display
  • 2D Materials
  • Thin films
  • Polymer
  • MEMS
  • Metals
  • Optical Element
  • Metal

• 
  LTPS Grain
• 
  The Surface Potential of Au-Al Material
• 
  SiC Atomic Step
• 
  Patterned Sapphire Substrate (PSS)
• 
  CMP Micro-Holes Array
• 
  OLED Pattern
• 
  ETL Structure
• 
  SiC Surface
• 
  The Edge Structure of PSS
• 
  The Surface Potential of SRAM
• 
  Standard Wafer
• 
  The Surface Potential of 2D Materials
• 
  Microelectrode
• 
  2D Material's Magnetic Domains
• 
  Glass Substrate
• 
  182 nm Standard Step Height
• 
  Girds Matrix
• 
  Roughness Standard Sample
• 
  Laser Marked Sample
• 
  Lubricant Seal Cover

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182 nm Standard Step Height

This is a standard step height topography image with a scanning range of 1.65 mm × 1.65 mm, with a nominal height of 181.0 nm ± 2.1 nm. It can be used to evaluate the accuracy and repeatability of the measurement systems, providing metrological traceability and a reference for measurement equipment.

182 nm Standard Step Height

Girds Matrix