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FreeSpirit (Shanghai) Precision Instrument Co., Ltd
EN
中
ography image of a polished silicon wafer with a scanning range of 0.272 mm × 0.408 mm. The surface height variation across the entire scanned area ranges between -12 nm and 6 nm, with a roughness of 0.842 nm. Polished silicon wafers are fundamental and critical substrate materials in semiconductor manufacturing. Their surface quality directly affects subsequent photolithography, thin-film deposition and other processes.

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Polished Silicon Wafer
Polished Silicon Wafer
  • Metal Scratch
    Metal Scratch

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    FreeSpirit (Shanghai) Precision Instrument Co., Ltd
    EN
    中
    or calibration of related instruments or process analysis.

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    Girds Matrix
    Girds Matrix
  • Roughness Standard Sample
    Roughness Standard Sample
  • Laser Marked Sample
    Laser Marked Sample
  • Lubricant Seal Cover
    Lubricant Seal Cover
  • Metal Groove
    Metal Groove
  • Metal Scratch
    Metal Scratch

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    FreeSpirit (Shanghai) Precision Instrument Co., Ltd
    EN
    中